Microstructure on SiO2-surface active & passive isolated
The following two images demonstrate the difference between active and passive vibration isolation.
The sample consists of microstructures etched on SiO2-surface.
Zeiss LSM Pascal + TS150
Passive Vibration Isolation
Active Vibration Isolation
The measurements were done by Prof. Hartl (FH Nuremberg, Germany)
with the Zeiss Laser Scanning Microscope Pascal (resolution 100x)
