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     Microstructure on SiO2-surface active & passive isolated

The following two images demonstrate the difference between active and passive vibration isolation.
The sample consists of microstructures etched on SiO2-surface.

Zeiss LSM Pascal + TS150
Passive Vibration Isolation
Active Vibration Isolation
The measurements were done by Prof. Hartl (FH Nuremberg, Germany) with the Zeiss Laser Scanning Microscope Pascal (resolution 100x)
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